Formula: CHF₃, R23, HC-23
What is trifluoromethane (CHF₃)?
Trifluoromethane has high density, low reactivity, and low toxicity, making it ideal for use in fire suppression systems as a flooding agent, for plasma etching in the semiconductor industry, specifically for silicon oxide and silicon nitride, and as a refrigerant.
Trifluoromethane (CHF₃), also known as fluoromethane or HFC-23, is used in semiconductor etch applications as an alternative to sulfur hexafluoride (SF6) and other gases.
What are the benefits of using trifluoromethane (CHF3) in semiconductor etching?
High selectivity:
CHF₃ has a high selectivity to silicon dioxide (SiO2) and other materials commonly used in semiconductor fabrication, making it a valuable tool in the etching of high-quality structures and devices.
High etch rate:
CHF₃ has a relatively high etch rate, allowing for faster etching of materials compared to some other gases.
Low toxicity:
CHF₃ is not highly toxic, making it safer for workers to handle and use in the semiconductor manufacturing process.
Compatibility:
CHF₃ is compatible with many materials commonly used in semiconductor fabrication, such as silicon, silicon nitride, and aluminum.
Overall, CHF₃ offers several benefits as an etching gas in semiconductor manufacturing, making it a valuable alternative to other gases. Its low environmental impact, high selectivity, and compatibility with various materials make it a useful tool for creating high-quality structures and devices in the semiconductor industry
What are some other applications of trifluoromethane (CHF₃)?
Refrigerant:
CHF₃ is used as a refrigerant in some applications, particularly in industrial refrigeration systems. It has a low global warming potential (GWP) compared to some other refrigerants, making it a more environmentally friendly choice.
Fire suppression:
CHF₃ can be used as a fire suppression agent in some applications, particularly in high-value electronics and data centers. It is effective at extinguishing fires and does not leave a residue that can damage electronic equipment.
Medical applications:
CHF₃ has been investigated for its potential as an inhalation anesthetic, as well as for its use in medical imaging applications. It has a low boiling point and is relatively inert, making it a suitable candidate for these applications.
Fluorinating agent:
CHF₃ can be used as a fluorinating agent in some chemical reactions, particularly in the synthesis of fluorinated compounds. It can be used to introduce a trifluoromethyl group (-CF3) into organic molecules, which can impart desirable properties such as increased lipophilicity and stability.
Plasma cleaning:
CHF₃ can be used in plasma cleaning applications, particularly for the removal of organic contaminants from surfaces. Plasma cleaning using CHF3 can be more effective and less damaging than other cleaning methods, such as wet chemical cleaning.
Overall, CHF₃ has a range of applications outside of semiconductor etching, demonstrating its versatility and usefulness in various industries.
**Moisture level guaranteed only when Electronic Fluorocarbons prepares the cylinders.
All concentrations are on a mol/mol basis unless otherwise stated.
Product sold on the basis of total impurities. Individual impurities may vary slightly.
*This gas not available for purchase online.
